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The Role of Hydrogen Incorporation into Amorphous Carbon Films in the Change of the Secondary Electron Yield / Bundaleski, Nenad (New Lisbon U.) ; Adame, Carolina F. (New Lisbon U.) ; Alves, Eduardo (IST, Lisbon ; Lisbon U.) ; Barradas, Nuno P. (IST, Lisbon ; Lisbon U.) ; Cerqueira, Maria F. (Minho U.) ; Deuermeier, Jonas (New Lisbon U.) ; Delaup, Yorick ; Ferraria, Ana M. (IST, Lisbon) ; Ferreira, Isabel M.M. (New Lisbon U.) ; Neupert, Holger (CERN) et al.
Over the last few years, there has been increasing interest in the use of amorphous carbon thin films with low secondary electron yield (SEY) to mitigate electron multipacting in particle accelerators and RF devices. Previous works found that the SEY increases with the amount of incorporated hydrogen and correlates with the Tauc gap. [...]
2023 - 20 p. - Published in : Int. J. Molecular Sci. 24 (2023) 12999 Fulltext: PDF;

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Amorphous carbon thin films: Mechanisms of hydrogen incorporationduring magnetron sputtering and consequences for the secondary electronemission / Adame, C F ; Alves, E (Lisbon, IST) ; Barradas, N P (Lisbon, IST) ; Costa Pinto, P (CERN) ; Delaup, Y (CERN) ; Ferreira, I M M ; Neupert, H (CERN) ; Himmerlich, M (CERN) ; Pfeiffer, S (CERN) ; Rimoldi, M (CERN) et al.
Amorphous carbon (a-C) films, having low secondary electron yield (SEY), are usedat CERN to suppress electron multipacting in the beam pipes of particleaccelerators. It was already demonstrated that hydrogen impurities increase theSEY of a-C films. [...]
2023 - 14 p. - Published in : J. Vac. Sci. Technol. A 41 (2023) 043412 Fulltext: PDF;

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