Główna > Characterization and control of wafer charging effects during high-current ion implantation |
Preprint | |
Report number | LBL-35962 |
Title | Characterization and control of wafer charging effects during high-current ion implantation |
Author(s) | Current, M I ; Lukaszek, W ; Dixon, W ; Vella, M C ; Messick, C ; Shideler, J ; Reno, S |
Publication | 1994 |
Imprint | Feb 1994 |
Number of pages | 16 |
Subject category | Engineering |