Showing 1–38 of 38 results for author: Moutanabbir, O

Light-hole spin confined in germanium

Authors: Patrick Del Vecchio, Oussama Moutanabbir

Abstract: The selective confinement of light holes (LHs) in a tensile-strained germanium (Ge) quantum well is studied by mapping the electronic structure of Ge$_{1-x}$Sn$_x$/Ge/Ge$_{1-x}$Sn$_x$ heterostructures as a function of Sn content, residual strain, and Ge well thickness. It is shown that above $12\,\text{at.}\%$ Sn and below $0.4\%$ residual compressive strain in the barriers, the tensile strain in… ▽ More The selective confinement of light holes (LHs) in a tensile-strained germanium (Ge) quantum well is studied by mapping the electronic structure of Ge$_{1-x}$Sn$_x$/Ge/Ge$_{1-x}$Sn$_x$ heterostructures as a function of Sn content, residual strain, and Ge well thickness. It is shown that above $12\,\text{at.}\%$ Sn and below $0.4\%$ residual compressive strain in the barriers, the tensile strain in Ge becomes sufficiently large to yield a valence band edge with LH-like character, thus forming a quasi two-dimensional LH gas in Ge. The LH ground state has a larger in-plane effective mass than that of heavy holes (HHs) in Si$_{1-y}$Ge$_y$/Ge/Si$_{1-y}$Ge$_y$ quantum wells. Moreover, LHs in optimal Ge$_{1-x}$Sn$_x$/Ge/Ge$_{1-x}$Sn$_x$ heterostructures are found to exhibit a strong $g$-tensor anisotropy, with the in-plane component one order of magnitude larger than that of HHs in typical planar systems. Two of three structure-inversion-asymmetry Rashba parameters, both of which are critical in electric-dipole-spin-resonance experiments, are effectively 10 times the size of the cubic Rashba parameter in HH quantum wells. In the regime of LH selective confinement, every layer of the heterostructure is of direct bandgap, which can be relevant for efficient optical photon-spin qubit interfaces. This work discusses the broad landscape of the characteristics of LH spin confined in Ge to guide the design and implementation of LH spin-based devices. △ Less

Submitted 1 July, 2024; v1 submitted 15 February, 2024; originally announced February 2024.

Mid-Infrared Detectors and Imagers Integrating All-Group IV Nanowires

Authors: Lu Luo, Mahmoud RM Atalla, Simone Assali, Sebastian Koelling, Gérard Daligou, Oussama Moutanabbir

Abstract: Cost-effective mid-wave infrared (MWIR) optoelectronic devices are of utmost importance to a plethora of applications such as night vision, thermal sensing, autonomous vehicles, free-space communication, and spectroscopy. To this end, leveraging the ubiquitous silicon-based processing has emerged as a powerful strategy that can be accomplished through the use of group IV germanium-tin (GeSn) alloy… ▽ More Cost-effective mid-wave infrared (MWIR) optoelectronic devices are of utmost importance to a plethora of applications such as night vision, thermal sensing, autonomous vehicles, free-space communication, and spectroscopy. To this end, leveraging the ubiquitous silicon-based processing has emerged as a powerful strategy that can be accomplished through the use of group IV germanium-tin (GeSn) alloys. Indeed, due to their compatibility with silicon and their tunable bandgap energy covering the entire MWIR range, GeSn semiconductors are frontrunner platforms for compact and scalable MWIR technologies. However, the GeSn large lattice parameter has been a major hurdle limiting the quality of GeSn epitaxy on silicon wafers. Herein, it is shown that sub-20 nm Ge nanowires (NWs) provide effective compliant substrates to grow Ge$_{1-x}$Sn$_{x}$ alloys with a composition uniformity over several micrometers with a very limited build-up of the compressive strain. Ge/Ge$_{1-x}$Sn$_{x}$ core/shell NWs with Sn content spanning the 6 to 18 at.$\%$ range are demonstrated and integrated in photoconductive devices exhibiting a high signal-to-noise ratio at room temperature and a tunable cutoff wavelength covering the 2.0 $μ$m to 3.9 $μ$m range. Additionally, the processed NW-based detectors were used in uncooled imagers enabling the acquisition of high-quality images under both broadband and laser illuminations without a lock-in technique. △ Less

Submitted 11 October, 2023; originally announced October 2023.

Nuclear Spin-Depleted, Isotopically Enriched 70Ge/28Si70Ge Quantum Wells

Authors: O. Moutanabbir, S. Assali, A. Attiaoui, G. Daligou, P. Daoust, P. Del Vecchio, S. Koelling, L. Luo, N. Rotaru

Abstract: The p-symmetry of the hole wavefunction is associated with a weaker hyperfine interaction as compared to electrons, thus making hole spin qubits attractive candidates to implement long coherence quantum processors. However, recent studies demonstrated that hole qubits in planar germanium (Ge) heterostructures are still very sensitive to nuclear spin bath. These observations highlight the need to d… ▽ More The p-symmetry of the hole wavefunction is associated with a weaker hyperfine interaction as compared to electrons, thus making hole spin qubits attractive candidates to implement long coherence quantum processors. However, recent studies demonstrated that hole qubits in planar germanium (Ge) heterostructures are still very sensitive to nuclear spin bath. These observations highlight the need to develop nuclear spin-free Ge qubits to suppress this decoherence channel and evaluate its impact. With this perspective, this work demonstrates the epitaxial growth of $^\text{73}$Ge-depleted isotopically enriched $^\text{70}$Ge/SiGe quantum wells. The growth was achieved by reduced pressure chemical vapor deposition using isotopically purified monogermane $^\text{70}$GeH$_\text{4}$ and monosilane $^\text{28}$SiH$_\text{4}$ with an isotopic purity higher than 99.9 $\%$ and 99.99 $\%$, respectively. The quantum wells consist of a series of $^\text{70}$Ge/SiGe heterostructures grown on Si wafers using a Ge virtual substrate and a graded SiGe buffer layer. The isotopic purity is investigated using atom probe tomography following an analytical procedure addressing the discrepancies in the isotopic content caused by the overlap of isotope peaks in mass spectra. The nuclear spin background in the quantum wells was found to be sensitive to the growth conditions. The lowest concentration of nuclear spin-full isotopes $^\text{73}$Ge and $^\text{29}$Si in the heterostructure was established at 0.01 $\%$ in the Ge quantum well and SiGe barriers. The measured average distance between nuclear spins reaches 3-4 nm in $^\text{70}$Ge/$^\text{28}$Si$^\text{70}$Ge, which is an order of magnitude larger than in natural Ge/SiGe heterostructures. △ Less

Submitted 7 June, 2023; v1 submitted 6 June, 2023; originally announced June 2023.

Comments: 9 pages, 4 figures

Extended-SWIR GeSn LEDs with reduced footprint and power consumption

Authors: Mahmoud R. M. Atalla, Youngmin Kim, Simone Assali, Daniel Burt, Donguk Nam, Oussama Moutanabbir

Abstract: CMOS-compatible short- and mid-wave infrared emitters are highly coveted for the monolithic integration of silicon-based photonic and electronic integrated circuits to serve a myriad of applications in sensing and communications. In this regard, a group IV germanium-tin (GeSn) material epitaxially grown on silicon (Si) emerges as a promising platform to implement tunable infrared light emitters. I… ▽ More CMOS-compatible short- and mid-wave infrared emitters are highly coveted for the monolithic integration of silicon-based photonic and electronic integrated circuits to serve a myriad of applications in sensing and communications. In this regard, a group IV germanium-tin (GeSn) material epitaxially grown on silicon (Si) emerges as a promising platform to implement tunable infrared light emitters. Indeed, upon increasing the Sn content, the bandgap of GeSn narrows and becomes direct, making this material system suitable for developing an efficient silicon-compatible emitter. With this perspective, microbridge PIN GeSn LEDs with a small footprint of $1,520$ $μ$m$^2$ are demonstrated and their operation performance is investigated. The spectral analysis of the electroluminescence emission exhibits a peak at $2.31$ $μ$m and it red-shifts slightly as the driving current increases. It is found that the microbridge LED operates at a dissipated power as low as $10.8$ W at room temperature and just $3$ W at $80$ K. This demonstrated low operation power is comparable to that reported for LEDs having a significantly larger footprint reaching $10^6$ $μ$m$^2$. The efficient thermal dissipation of the current design helped to reduce the heat-induced optical losses, thus enhancing light emission. Further performance improvements are envisioned through thermal and optical simulations of the microbridge design. The use of GeSnOI substrate for developing a similar device is expected to improve optical confinement for the realization of electrically driven GeSn lasers. △ Less

Submitted 12 February, 2023; originally announced February 2023.

Mid-Infrared Optical Spin Injection and Coherent Control

Authors: Gabriel Fettu, John E. Sipe, Oussama Moutanabbir

Abstract: The optical injection of charge and spin currents are investigated in Ge$_{1-x}$Sn$_{x}$ semiconductors as a function of Sn content. These emerging silicon-compatible materials enable the modulation of these processes across the entire mid-infrared range. Under the independent particle approximation, the one- and two-photon interband absorption processes are elucidated, and the evolution of the co… ▽ More The optical injection of charge and spin currents are investigated in Ge$_{1-x}$Sn$_{x}$ semiconductors as a function of Sn content. These emerging silicon-compatible materials enable the modulation of these processes across the entire mid-infrared range. Under the independent particle approximation, the one- and two-photon interband absorption processes are elucidated, and the evolution of the coherent control is discussed for three different polarization configurations. To evaluate the contribution of high-energy transitions, a full-zone 30-band k$\cdot$p is employed in the calculations. It was found that, besides the anticipated narrowing of the direct gap and the associated shift of the absorption to longer wavelengths, incorporating Sn in Ge also increases the one-photon degree of spin polarization (DSP) at the $E_1$ resonance. Moreover, as the Sn content increases, the magnitude of the response tensors near the band edge exhibits an exponential enhancement. This behavior can be attributed to the Sn incorporation-induced decrease in the carrier effective masses. This trend appears to hold also at the $E_1$ resonance for pure spin current injection, at least at low Sn compositions. The two-photon DSP at the band edge exceeds the value in Ge to reach 60 % at a Sn content above 14 %. These results demonstrate that Ge$_{1-x}$Sn$_{x}$ semiconductors can be exploited to achieve the quantum coherent manipulation in the molecular fingerprint region relevant to quantum sensing. △ Less

Submitted 8 December, 2022; originally announced December 2022.

Comments: 8 pages, 9 figures, with a Supporting Material file

Polarization-Tuned Fano Resonances in All-Dielectric Short-Wave Infrared Metasurface

Authors: Anis Attiaoui, Gérard Daligou, Simone Assali, Oliver Skibitzki, Thomas Schroeder, Oussama Moutanabbir

Abstract: The short-wave infrared (SWIR) is an underexploited portion of the electromagnetic spectrum in metasurface-based nanophotonics despite its strategic importance in sensing and imaging applications. This is mainly attributed to the lack of material systems to tailor light-matter interactions in this range. Herein, we address this limitation and demonstrate an all-dielectric silicon-integrated metasu… ▽ More The short-wave infrared (SWIR) is an underexploited portion of the electromagnetic spectrum in metasurface-based nanophotonics despite its strategic importance in sensing and imaging applications. This is mainly attributed to the lack of material systems to tailor light-matter interactions in this range. Herein, we address this limitation and demonstrate an all-dielectric silicon-integrated metasurface enabling polarization-induced Fano resonance control at SWIR frequencies. The platform consists of a two-dimensional Si/GeSn core/shell nanowire array on a silicon wafer. By tuning the light polarization, we show that the metasurface reflectance can be efficiently engineered due to Fano resonances emerging from the electric and magnetic dipoles competition. The interference of optically induced dipoles in high-index nanowire arrays offers additional degrees of freedom to tailor the directional scattering and the flow of light while enabling sharp polarization-modulated resonances. This tunability is harnessed in nanosensors yielding an efficient detection of 10^{-2} changes in the refractive index of the surrounding medium. △ Less

Submitted 1 December, 2022; originally announced December 2022.

Light-Hole Gate-Defined Spin-Orbit Qubit

Authors: Patrick Del Vecchio, Oussama Moutanabbir

Abstract: The selective confinement of light-holes (LHs) is demonstrated by introducing a low-dimensional system consisting of highly tensile-strained Ge quantum well enabling the design of an ultrafast gate-defined spin qubit under the electric dipole spin resonance. The qubit size-dependent $g$-factor and dipole moment are mapped, and the parameters inducing their modulation are discussed. It is found tha… ▽ More The selective confinement of light-holes (LHs) is demonstrated by introducing a low-dimensional system consisting of highly tensile-strained Ge quantum well enabling the design of an ultrafast gate-defined spin qubit under the electric dipole spin resonance. The qubit size-dependent $g$-factor and dipole moment are mapped, and the parameters inducing their modulation are discussed. It is found that the LH qubit dipole moment is 2 to 3 orders of magnitude higher than that of the canonical heavy-hole qubit. This behavior originates from the significant spin splitting resulting from the combined action of large cubic and linear Rashba spin-orbit interactions that are peculiar to LHs. The qubit relaxation rate is also affected by the strong spin-orbit interaction and follows typically a $B^7$ behavior. The proposed all-group IV, direct bandgap LH qubit provides an effective platform for a scalable qubit-optical photon interface sought-after for long-range entanglement distribution and quantum networks. △ Less

Submitted 20 April, 2023; v1 submitted 18 November, 2022; originally announced November 2022.

500-period epitaxial Ge/Si0.18Ge0.82 multi-quantum wells on silicon

Authors: Simone Assali, Sebastian Koelling, Zeinab Abboud, Jérôme Nicolas, Anis Attiaoui, Oussama Moutanabbir

Abstract: Ge/SiGe multi-quantum well heterostructures are highly sought-after for silicon-integrated optoelectronic devices operating in the broad range of the electromagnetic spectrum covering infrared to terahertz wavelengths. However, the epitaxial growth of these heterostructures at a thickness of a few microns has been a challenging task due the lattice mismatch and its associated instabilities resulti… ▽ More Ge/SiGe multi-quantum well heterostructures are highly sought-after for silicon-integrated optoelectronic devices operating in the broad range of the electromagnetic spectrum covering infrared to terahertz wavelengths. However, the epitaxial growth of these heterostructures at a thickness of a few microns has been a challenging task due the lattice mismatch and its associated instabilities resulting from the formation of growth defects. To elucidates these limits, we outline herein a process for the strain-balanced growth on silicon of 11.1 nm/21.5 nm Ge/Si0.18Ge0.82 superlattices (SLs) with a total thickness of 16 μm corresponding to 500 periods. Composition, thickness, and interface width are preserved across the entire SL heterostructure, which is an indication of limited Si-Ge intermixing. High crystallinity and low defect density are obtained in the Ge/Si0.18Ge0.82 layers, however, the dislocation pile up at the interface with the growth substate induces micrometer-longs cracks on the surface. This eventually leads to significant layer tilt in the strain-balanced SL and in the formation of millimeter-long, free-standing flakes. These results confirm the local uniformity of structural properties and highlight the critical importance of threading dislocations in shaping the wafer-level stability of thick multi-quantum well heterostructures required to implement effective silicon-compatible Ge/SiGe photonic devices. △ Less

Submitted 16 May, 2022; originally announced May 2022.

Localized Energy States Induced by Atomic-Level Interfacial Broadening in Heterostructures

Authors: Anis Attiaoui, Gabriel Fettu, Samik Mukherjee, Matthias Bauer, Oussama Moutanabbir

Abstract: A theoretical framework incorporating atomic-level interfacial details is derived to include the electronic structure of buried interfaces and describe the behavior of charge carriers in heterostructures in the presence of finite interfacial broadening. Applying this model to ultrathin heteroepitaxial (SiGe)m/(Si)m superlattices predicts the existence of localized energy levels in the band structu… ▽ More A theoretical framework incorporating atomic-level interfacial details is derived to include the electronic structure of buried interfaces and describe the behavior of charge carriers in heterostructures in the presence of finite interfacial broadening. Applying this model to ultrathin heteroepitaxial (SiGe)m/(Si)m superlattices predicts the existence of localized energy levels in the band structure induced by sub-nanometer broadening, which provides additional paths for hole-electron recombination. These predicted interfacial electronic transitions and the associated absorptive effects are confirmed experimentally at variable superlattice thickness and periodicity. By mapping the energy of the critical points, the optical transitions are identified between 2 and 2.5 eV thus extending the optical absorption to lower energies. This phenomenon enables a straightforward and non-destructive probe of the atomic-level broadening in heterostructures. △ Less

Submitted 27 March, 2022; originally announced March 2022.

Comments: 6 pages, 4 figures with a Supporting Material file

Dark current in monolithic extended-SWIR GeSn PIN photodetectors

Authors: Mahmoud R. M. Atalla, Simone Assali, Sebastian Koelling, Anis Attiaoui, Oussama Moutanabbir

Abstract: The monolithic integration of extended short-wave infrared (e-SWIR) photodetectors (PDs) on silicon is highly sought-after to implement manufacturable, cost-effective sensing and imaging technologies. With this perspective, GeSn PIN PDs have been the subject of extensive investigations because of their bandgap tunability and silicon compatibility. However, due to growth defects, these PDs suffer a… ▽ More The monolithic integration of extended short-wave infrared (e-SWIR) photodetectors (PDs) on silicon is highly sought-after to implement manufacturable, cost-effective sensing and imaging technologies. With this perspective, GeSn PIN PDs have been the subject of extensive investigations because of their bandgap tunability and silicon compatibility. However, due to growth defects, these PDs suffer a relatively high dark current density as compared to commercial III-V PDs. Herein, we elucidate the mechanisms governing the dark current in $2.6 \, μ$m GeSn PDs at a Sn content of $10$ at.%. It was found that in the temperature range of $293 \, $K -- $363 \,$K and at low bias, the diffusion and Shockley-Read-Hall (SRH) leakage mechanisms dominate the dark current in small diameter ($20 \, μ$m) devices, while combined SRH and trap assisted tunneling (TAT) leakage mechanisms are prominent in larger diameter ($160 \, μ$m) devices. However, at high reverse bias, TAT leakage mechanism becomes dominant regardless of the operating temperature and device size. The effective non-radiative carrier lifetime in these devices was found to reach $\sim 300$ -- $400$ ps at low bias. Owing to TAT leakage current, however, this lifetime reduces progressively as the bias increases. △ Less

Submitted 8 March, 2022; v1 submitted 7 March, 2022; originally announced March 2022.

Ge-Ge$_{0.92}$Sn$_{0.08}$ core-shell single nanowire infrared photodetector with superior characteristics for on-chip optical communication

Authors: Sudarshan Singh, Subhrajit Mukherjee, Samik Mukherjee, Simone Assali, Lu Luo, Samaresh Das, Oussama Moutanabbir, Samit K Ray

Abstract: Recent development on Ge$_{1-x}$Sn$_x$ nanowires with high Sn content, beyond its solid solubility limit, make them attractive for all group-IV Si-integrated infrared photonics at nanoscale. Herein, we report a chemical vapour deposition-grown high Sn-content Ge-Ge$_{0.92}$Sn$_{0.08}$ core-shell based single nanowire photodetector operating at the optical communication wavelength of 1.55 $μ$m. The… ▽ More Recent development on Ge$_{1-x}$Sn$_x$ nanowires with high Sn content, beyond its solid solubility limit, make them attractive for all group-IV Si-integrated infrared photonics at nanoscale. Herein, we report a chemical vapour deposition-grown high Sn-content Ge-Ge$_{0.92}$Sn$_{0.08}$ core-shell based single nanowire photodetector operating at the optical communication wavelength of 1.55 $μ$m. The atomic concentration of Sn in nanowires has been studied using X-ray photoelectron and Raman spectroscopy data. A metal-semiconductor-metal based single nanowire photodetector, fabricated via electron beam lithography process, exhibits significant room-temperature photoresponse even at zero bias. In addition to the high-crystalline quality and identical shell composition of the nanowire, the efficient collection of photogenerated carriers under an external electric field result in the superior responsivity and photoconductive gain as high as ~70.8 A/W and ~57, respectively at an applied bias of -1.0 V. The extra-ordinary performance of the fabricated photodetector demonstrates the potential of GeSn nanowires for future Si CMOS compatible on-chip optical communication device applications. △ Less

Submitted 4 February, 2022; originally announced February 2022.

Comments: 16 pages, 4 figures, Supplementary material (2 Figures, 2 tables)

A Light-Hole Quantum Well on Silicon

Authors: Simone Assali, Anis Attiaoui, Patrick Del Vecchio, Samik Mukherjee, Jérôme Nicolas, Oussama Moutanabbir

Abstract: The quiet quantum environment of holes in solid-state devices has been at the core of increasingly reliable architectures for quantum processors and memories.1-6 However, due to the lack of scalable materials to properly tailor the valence band character and its energy offsets, the precise engineering of light-hole (LH) states remains a serious obstacle toward coherent photon-spin interfaces neede… ▽ More The quiet quantum environment of holes in solid-state devices has been at the core of increasingly reliable architectures for quantum processors and memories.1-6 However, due to the lack of scalable materials to properly tailor the valence band character and its energy offsets, the precise engineering of light-hole (LH) states remains a serious obstacle toward coherent photon-spin interfaces needed for a direct mapping of the quantum information encoded in photon flying qubits to stationary spin processor.4-9 Herein, to alleviate this long-standing limitation we demonstrate an all-group IV low-dimensional system consisting of highly tensile strained germanium quantum well grown on silicon allowing new degrees of freedom to control and manipulate the hole states. Wafer-level, high bi-isotropic in-plane tensile strain ($>1\%$) is achieved using strain-engineered, metastable germanium-tin alloyed buffer layers yielding quantum wells with LH ground state, high $g$-factor anisotropy, and a tunable splitting of the hole subbands. The epitaxial heterostructures display sharp interfaces with sub-nanometer broadening and show room-temperature excitonic transitions that are modulated and extended to the mid-wave infrared by controlling strain and thickness. This ability to engineer quantum structures with LH selective confinement and controllable optical response enables manufacturable silicon-compatible platforms relevant to integrated quantum communication and sensing technologies. △ Less

Submitted 2 January, 2022; v1 submitted 30 December, 2021; originally announced December 2021.

Atomic fluctuations lifting the energy degeneracy in Si/SiGe quantum dots

Authors: Brian Paquelet Wuetz, Merritt P. Losert, Sebastian Koelling, Lucas E. A. Stehouwer, Anne-Marije J. Zwerver, Stephan G. J. Philips, Mateusz T. Mądzik, Xiao Xue, Guoji Zheng, Mario Lodari, Sergey V. Amitonov, Nodar Samkharadze, Amir Sammak, Lieven M. K. Vandersypen, Rajib Rahman, Susan N. Coppersmith, Oussama Moutanabbir, Mark Friesen, Giordano Scappucci

Abstract: Electron spins in Si/SiGe quantum wells suffer from nearly degenerate conduction band valleys, which compete with the spin degree of freedom in the formation of qubits. Despite attempts to enhance the valley energy splitting deterministically, by engineering a sharp interface, valley splitting fluctuations remain a serious problem for qubit uniformity, needed to scale up to large quantum processor… ▽ More Electron spins in Si/SiGe quantum wells suffer from nearly degenerate conduction band valleys, which compete with the spin degree of freedom in the formation of qubits. Despite attempts to enhance the valley energy splitting deterministically, by engineering a sharp interface, valley splitting fluctuations remain a serious problem for qubit uniformity, needed to scale up to large quantum processors. Here, we elucidate and statistically predict the valley splitting by the holistic integration of 3D atomic-level properties, theory and transport. We find that the concentration fluctuations of Si and Ge atoms within the 3D landscape of Si/SiGe interfaces can explain the observed large spread of valley splitting from measurements on many quantum dot devices. Against the prevailing belief, we propose to boost these random alloy composition fluctuations by incorporating Ge atoms in the Si quantum well to statistically enhance valley splitting. △ Less

Submitted 1 December, 2022; v1 submitted 17 December, 2021; originally announced December 2021.

Journal ref: Nature Communications 13, 7730 (2022)

Recrystallization and Interdiffusion Processes in Laser-Annealed Strain-Relaxed Metastable Ge$_{0.89}$Sn0$_{.11}$

Authors: Salim Abdi, Simone Assali, Mahmoud R. M. Atalla, Sebastian Koelling, Jeffrey M. Warrender, Oussama Moutanabbir

Abstract: The prospect of GeSn semiconductors for silicon-integrated infrared optoelectronics brings new challenges related to the metastability of this class of materials. As a matter of fact, maintaining a reduced thermal budget throughout all processing steps of GeSn devices is essential to avoid possible material degradation. This constraint is exacerbated by the need for higher Sn contents along with a… ▽ More The prospect of GeSn semiconductors for silicon-integrated infrared optoelectronics brings new challenges related to the metastability of this class of materials. As a matter of fact, maintaining a reduced thermal budget throughout all processing steps of GeSn devices is essential to avoid possible material degradation. This constraint is exacerbated by the need for higher Sn contents along with an enhanced strain relaxation to achieve efficient mid-infrared devices. Herein, as a low thermal budget solution for post-epitaxy processing, we elucidate the effects of laser thermal annealing (LTA) on strain-relaxed Ge$_{0.89}$Sn0$_{.11}$ layers and Ni-Ge$_{0.89}$Sn0$_{.11}$ contacts. Key diffusion and recrystallization processes are proposed and discussed in the light of systematic microstructural studies. LTA treatment at a fluence of 0.40 J/cm2 results in a 200-300 nm-thick layer where Sn atoms segregate toward the surface and in the formation of Sn-rich columnar structures in the LTA-affected region. These structures are reminiscent to those observed in the dislocation-assisted pipe-diffusion mechanism, while the buried GeSn layers remain intact. Moreover, by tailoring the LTA fluence, the contact resistance can be reduced without triggering phase separation across the whole GeSn multi-layer stacking. Indeed, a one order of magnitude decrease in the Ni-based specific contact resistance was obtained at the highest LTA fluence, thus confirming the potential of this method for the functionalization of direct bandgap GeSn materials. △ Less

Submitted 12 November, 2021; originally announced November 2021.

Electronic Structure and Epitaxy of CdTe Shells on InSb Nanowires

Authors: Ghada Badawy, Bomin Zhang, Tomáš Rauch, Jamo Momand, Sebastian Koelling, Jason Jung, Sasa Gazibegovic, Oussama Moutanabbir, Bart J. Kooi, Silvana Botti, Marcel A. Verheijen, Sergey M. Frolov, Erik P. A. M. Bakkers

Abstract: Indium antimonide (InSb) nanowires are used as building blocks for quantum devices because of their unique properties, i.e., strong spin-orbit interaction and large Landé g-factor. Integrating InSb nanowires with other materials could potentially unfold novel devices with distinctive functionality. A prominent example is the combination of InSb nanowires with superconductors for the emerging topol… ▽ More Indium antimonide (InSb) nanowires are used as building blocks for quantum devices because of their unique properties, i.e., strong spin-orbit interaction and large Landé g-factor. Integrating InSb nanowires with other materials could potentially unfold novel devices with distinctive functionality. A prominent example is the combination of InSb nanowires with superconductors for the emerging topological particles research. Here, we combine the II-VI cadmium telluride (CdTe) with the III-V InSb in the form of core-shell (InSb-CdTe) nanowires and explore potential applications based on the electronic structure of the InSb-CdTe interface and the epitaxy of CdTe on the InSb nanowires. We determine the electronic structure of the InSb-CdTe interface using density functional theory and extract a type-I band alignment with a small conduction band offset ($\leq$ 0.3 eV). These results indicate the potential application of these shells for surface passivation or as tunnel barriers in combination with superconductors. In terms of the structural quality of these shells, we demonstrate that the lattice-matched CdTe can be grown epitaxially on the InSb nanowires without interfacial strain or defects. These epitaxial shells do not introduce disorder to the InSb nanowires as indicated by the comparable field-effect mobility we measure for both uncapped and CdTe-capped nanowires. △ Less

Submitted 9 November, 2021; originally announced November 2021.

High-Bandwidth Extended-SWIR GeSn Photodetectors on Silicon Achieving Ultrafast Broadband Spectroscopic Response

Authors: M. R. M. Atalla, S. Assali, S. Koelling, A. Attiaoui, O. Moutanabbir

Abstract: The availability of high-frequency pulsed emitters in the $2-2.5\,μ$m wavelength range paved the way for a wealth of new applications in ultrafast spectroscopy, free-space and fiber-optical communications, surveillance and recognition, artificial intelligence, and medical imaging. However, developing these emerging technologies and their large-scale use depend on the availability of high-speed, lo… ▽ More The availability of high-frequency pulsed emitters in the $2-2.5\,μ$m wavelength range paved the way for a wealth of new applications in ultrafast spectroscopy, free-space and fiber-optical communications, surveillance and recognition, artificial intelligence, and medical imaging. However, developing these emerging technologies and their large-scale use depend on the availability of high-speed, low-noise, and cost-effective photodetectors. With this perspective, here we demonstrate GeSn photodiodes grown on silicon wafers featuring a high broadband operation covering the extended-SWIR range with a peak responsivity of 0.3 A/W at room temperature. These GeSn devices exhibit a high bandwidth reaching 7.5 GHz at 5 V bias with a 2.6 $μ$m cutoff wavelength, and their integration in ultrafast time-resolved spectroscopy applications is demonstrated. In addition to enabling time-resolved electro-luminescence at 2.3 $μ$m, the high-speed operation of GeSn detectors was also exploited in the diagnostics of ultra-short pulses of a supercontinuum laser with a temporal resolution in the picosecond range at 2.5 $μ$m. Establishing these capabilities highlights the potential of manufacturable GeSn photodiodes for silicon-integrated high-speed extended-SWIR applications. △ Less

Submitted 4 November, 2021; originally announced November 2021.

Growth of PbTe nanowires by Molecular Beam Epitaxy

Authors: Sander G. Schellingerhout, Eline J. de Jong, Maksim Gomanko, Xin Guan, Yifan Jiang, Max S. M. Hoskam, Sebastian Koelling, Oussama Moutanabbir, Marcel A. Verheijen, Sergey M. Frolov, Erik P. A. M. Bakkers

Abstract: Advances in quantum technology may come from the discovery of new materials systems that improve the performance or allow for new functionality in electronic devices. Lead telluride (PbTe) is a member of the group IV-VI materials family that has significant untapped potential for exploration. Due to its high electron mobility, strong spin-orbit coupling and ultrahigh dielectric constant it can hos… ▽ More Advances in quantum technology may come from the discovery of new materials systems that improve the performance or allow for new functionality in electronic devices. Lead telluride (PbTe) is a member of the group IV-VI materials family that has significant untapped potential for exploration. Due to its high electron mobility, strong spin-orbit coupling and ultrahigh dielectric constant it can host few-electron quantum dots and ballistic quantum wires with opportunities for control of electron spins and other quantum degrees of freedom. Here, we report the fabrication of PbTe nanowires by molecular beam epitaxy. We achieve defect-free single crystalline PbTe with large aspect ratios up to 50 suitable for quantum devices. Furthermore, by fabricating a single nanowire field effect transistor, we attain bipolar transport, extract the bandgap and observe Fabry-Perot oscillations of conductance, a signature of quasiballistic transmission. △ Less

Submitted 25 October, 2021; originally announced October 2021.

Te-doped selective-area grown InAs nanowires for superconducting hybrid devices

Authors: Pujitha Perla, Anton Faustmann, Sebastian Koelling, Patrick Zellekens, Russell Deacon, H. Aruni Fonseka, Jonas Kölzer, Yuki Sato, Ana M. Sanchez, Oussama Moutanabbir, Koji Ishibashi, Detlev Grützmacher, Mihail Ion Lepsa, Thomas Schäpers

Abstract: Semiconductor nanowires have emerged as versatile components in superconducting hybrid devices for Majorana physics and quantum computing. The transport properties of nanowires can be tuned either by field-effect or doping. We investigated a series of InAs nanowires which conductivity has been modified by n-type doping using tellurium. In addition to electron microscopy studies, the wires were als… ▽ More Semiconductor nanowires have emerged as versatile components in superconducting hybrid devices for Majorana physics and quantum computing. The transport properties of nanowires can be tuned either by field-effect or doping. We investigated a series of InAs nanowires which conductivity has been modified by n-type doping using tellurium. In addition to electron microscopy studies, the wires were also examined with atomic probe tomography to obtain information about the local incorporation of Te atoms. It was found that the Te atoms mainly accumulate in the core of the nanowire and at the corners of the {110} side facets. The efficiency of n-type doping was also confirmed by transport measurements. As a demonstrator hybrid device, a Josephson junction was fabricated using a nanowire as a weak link. The corresponding measurements showed a clear increase of the critical current with increase of the dopant concentration. △ Less

Submitted 18 October, 2021; originally announced October 2021.

Comments: 9 pages, 9 figures

Atomic Pathways of Solute Segregation in the Vicinity of Nanoscale Defects

Authors: Samik Mukherjee, Simone Assali, Oussama Moutanabbir

Abstract: This work unravels the atomic details of the interaction of solute atoms with nanoscale crystalline defects. The complexity of this phenomenon is elucidated through detailed atom probe tomographic investigations on epitaxially-strained, compositionally metastable, semiconductor alloys. Subtle variations are uncovered in the concentration and distribution of solute atoms surrounding dislocations, a… ▽ More This work unravels the atomic details of the interaction of solute atoms with nanoscale crystalline defects. The complexity of this phenomenon is elucidated through detailed atom probe tomographic investigations on epitaxially-strained, compositionally metastable, semiconductor alloys. Subtle variations are uncovered in the concentration and distribution of solute atoms surrounding dislocations, and their dynamic evolution is highlighted. The results demonstrate that crystal defects, such as dislocations, are instrumental in initiating the process of phase separation in strained metastable layers. Matrix regions, close to the dislocations, show clear signs of compositional degradation only after a relatively short time from disrupting the local equilibrium. The solute concentration as well as the density of non-random atomic clusters increases while approaching a dislocation from the surrounding matrix region. In parallel, far from a dislocation the lattice remains intact preserving the metastable structure and composition uniformity. At advanced stages of phase separation, the matrix outside the dislocation reaches the equilibrium concentration, while dislocations act as vehicles of mass-transport, providing fast diffusive channels for solute atoms to reach the surface. Besides, the number of atomic clusters almost doubles and the number of atoms per cluster increases steadily, moving along a dislocation towards the surface. In addition to understanding the atomic features involved in the phase separation of strained metastable alloys, the work also illustrates the thermodynamic and kinetic behavior of solute atoms in the vicinity of a nanoscale defect and describe quantitatively the key processes, thus providing the empirical input to improve the atomic models and simulations. △ Less

Submitted 1 July, 2021; originally announced July 2021.

Micrometer-thick, atomically random Si0.06Ge0.90Sn0.04 for silicon-integrated infrared optoelectronics

Authors: Simone Assali, Anis Attiaoui, Sebastian Koelling, Mahmoud R. M. Atalla, Aashish Kumar, Jérôme Nicolas, Faqrul A. Chowdhury, Cédric Lemieux-Leduc, Oussama Moutanabbir

Abstract: A true monolithic infrared photonics platform is within reach if strain and bandgap energy can be independently engineered in SiGeSn semiconductors. Herein, we investigate the structural and optoelectronic properties of a 1.5 μm-thick Si0.06Ge0.90Sn0.04 layer that is nearly lattice-matched to a Ge on Si substrate. Atomic-level studies demonstrate high crystalline quality and uniform composition an… ▽ More A true monolithic infrared photonics platform is within reach if strain and bandgap energy can be independently engineered in SiGeSn semiconductors. Herein, we investigate the structural and optoelectronic properties of a 1.5 μm-thick Si0.06Ge0.90Sn0.04 layer that is nearly lattice-matched to a Ge on Si substrate. Atomic-level studies demonstrate high crystalline quality and uniform composition and show no sign of short-range ordering and clusters. Room temperature spectroscopic ellipsometry and transmission measurements show direct bandgap absorption at 0.83 eV and a reduced indirect bandgap absorption at lower energies. Si0.06Ge0.90Sn0.04 photoconductive devices operating at room temperature exhibit dark current and spectral responsivity (1 A/W below 1.5 μm wavelengths) similar to Ge on Si devices, with the advantage of a near-infrared band gap tunable by alloy composition. These results underline the relevance of SiGeSn semiconductors in implementing a group IV material platform for silicon-integrated infrared optoelectronics. △ Less

Submitted 12 August, 2022; v1 submitted 3 March, 2021; originally announced March 2021.

Combined Iodine- and Sulfur-based Treatments for an Effective Passivation of GeSn Surface

Authors: Léonor Groell, Anis Attiaoui, Simone Assali, Oussama Moutanabbir

Abstract: GeSn alloys are metastable semiconductors that have been proposed as building blocks for silicon-integrated short-wave and mid-wave infrared photonic and sensing platforms. Exploiting these semiconductors requires, however, the control of their epitaxy and their surface chemistry to reduce non-radiative recombination that hinders the efficiency of optoelectronic devices. Herein, we demonstrate tha… ▽ More GeSn alloys are metastable semiconductors that have been proposed as building blocks for silicon-integrated short-wave and mid-wave infrared photonic and sensing platforms. Exploiting these semiconductors requires, however, the control of their epitaxy and their surface chemistry to reduce non-radiative recombination that hinders the efficiency of optoelectronic devices. Herein, we demonstrate that a combined sulfur- and iodine-based treatments yields effective passivation of Ge and Ge0.9Sn0.1 surfaces. X-ray photoemission spectroscopy and in situ spectroscopic ellipsometry measurements were used to investigate the dynamics of surface stability and track the reoxidation mechanisms. Our analysis shows that the largest reduction in oxide after HI treatment, while HF+(NH4)2S results in a lower re-oxidation rate. A combined HI+(NH4)2S treatment preserves the lowest oxide ratio <10 % up to 1 hour of air exposure, while less than half of the initial oxide coverage is reached after 4 hours. These results highlight the potential of S- and I-based treatments in stabilizing the GeSn surface chemistry thus enabling a passivation method that is compatible with materials and device processing. △ Less

Submitted 23 February, 2021; originally announced February 2021.

Monolithic Infrared Silicon Photonics: The Rise of (Si)GeSn Semiconductors

Authors: Oussama Moutanabbir, Simone Assali, Xiao Gong, Eoin O'Reilly, Chris Broderick, Bahareh Marzban, Jeremy Witzens, Wei Du, Shui-Qing Yu, Alexei Chelnokov, Dan Buca, Donguk Nam

Abstract: (Si)GeSn semiconductors are finally coming of age after a long gestation period. The demonstration of device quality epi-layers and quantum-engineered heterostructures has meant that tunable all-group IV Si-integrated infrared photonics is now a real possibility. Notwithstanding the recent exciting developments in (Si)GeSn materials and devices, this family of semiconductors is still facing seriou… ▽ More (Si)GeSn semiconductors are finally coming of age after a long gestation period. The demonstration of device quality epi-layers and quantum-engineered heterostructures has meant that tunable all-group IV Si-integrated infrared photonics is now a real possibility. Notwithstanding the recent exciting developments in (Si)GeSn materials and devices, this family of semiconductors is still facing serious limitations that need to be addressed to enable reliable and scalable applications. The main outstanding challenges include the difficulty to grow high crystalline quality layers and heterostructures at the desired Sn content and lattice strain, preserve the material integrity during growth and throughout device processing steps, and control doping and defect density. Other challenges are related to the lack of optimized device designs and predictive theoretical models to evaluate and simulate the fundamental properties and performance of (Si)GeSn layers and heterostructures. This Perspective highlights key strategies to circumvent these hurdles and bring this material system to maturity to create far-reaching new opportunities for Si-compatible infrared photodetectors, sensors, and emitters for applications in free-space communication, infrared harvesting, biological and chemical sensing, and thermal imaging. △ Less

Submitted 8 January, 2021; originally announced January 2021.

All-Group IV membrane room-temperature mid-infrared photodetector

Authors: Mahmoud R. M. Atalla, Simone Assali, Anis Attiaoui, Cedric Lemieux-Leduc, Aashish Kumar, Salim Abdi, Oussama Moutanabbir

Abstract: Strain engineering has been a ubiquitous paradigm to tailor the electronic band structure and harness the associated new or enhanced fundamental properties in semiconductors. In this regard, semiconductor membranes emerged as a versatile class of nanoscale materials to control lattice strain and engineer complex heterostructures leading to the development of a variety of innovative applications. H… ▽ More Strain engineering has been a ubiquitous paradigm to tailor the electronic band structure and harness the associated new or enhanced fundamental properties in semiconductors. In this regard, semiconductor membranes emerged as a versatile class of nanoscale materials to control lattice strain and engineer complex heterostructures leading to the development of a variety of innovative applications. Herein we exploit this quasi-two-dimensional platform to tune simultaneously the lattice parameter and bandgap energy in group IV GeSn semiconductor alloys. As Sn content is increased to reach a direct band gap, these semiconductors become metastable and typically compressively strained. We show that the release and transfer of GeSn membranes lead to a significant relaxation thus extending the absorption wavelength range deeper in the mid-infrared. Fully released Ge$_{0.83}$Sn$_{0.17}$ membranes were integrated on silicon and used in the fabrication of broadband photodetectors operating at room temperature with a record wavelength cutoff of 4.6 $μ$m, without compromising the performance at shorter wavelengths down to 2.3 $μ$m. These membrane devices are characterized by two orders of magnitude reduction in dark current as compared to devices processed from as-grown strained epitaxial layers. The latter exhibit a content-dependent, shorter wavelength cutoff in the 2.6-3.5 $μ$m range, thus highlighting the role of lattice strain relaxation in shaping the spectral response of membrane photodetectors. This ability to engineer all-group IV transferable mid-infrared photodetectors lays the groundwork to implement scalable and flexible sensing and imaging technologies exploiting these integrative, silicon-compatible strained-relaxed GeSn membranes. △ Less

Submitted 28 August, 2020; v1 submitted 23 July, 2020; originally announced July 2020.

Disentangling Phonon Channels in Nanoscale Thermal Transport

Authors: Samik Mukherjee, Marcin Wajs, Maria de la Mata, Uri Givan, Stephan Senz, Jordi Arbiol, Sebastien Francoeur, Oussama Moutanabbir

Abstract: Phonon surface scattering has been at the core of heat transport engineering in nanoscale structures and devices. Herein, we demonstrate that this phonon pathway can be the sole mechanism only below a characteristic, size-dependent temperature. Above this temperature, the lattice phonon scattering co-exist along with surface effects. By artificially controlling mass disorder and lattice dynamics a… ▽ More Phonon surface scattering has been at the core of heat transport engineering in nanoscale structures and devices. Herein, we demonstrate that this phonon pathway can be the sole mechanism only below a characteristic, size-dependent temperature. Above this temperature, the lattice phonon scattering co-exist along with surface effects. By artificially controlling mass disorder and lattice dynamics at the atomic-level in nanowires without affecting morphology, crystallinity, chemical composition, and electronic properties, the temperature-thermal conductivity-diameter triple parameter space is mapped, and the main phonon scattering mechanisms are disentangled. This led to the identification of the critical temperature at which the effect of lattice mass-disorder on thermal conductivity is suppressed to an extent that phonon transport becomes governed entirely by the surface. This behavior is discussed based on Landauer-Dutta-Lundstrom near-equilibrium transport model. The established framework provides the necessary input to further advance the design and modelling of phonon and heat transport in semiconductor nanoscale systems. △ Less

Submitted 8 July, 2020; originally announced July 2020.

Comments: 12 pages text, 4 Figures, 13 pages Supplementary Information

Journal ref: Phys. Rev. B 104, 075429 (2021)

Extended Short-Wave Infrared Absorption in Group IV Nanowire Arrays

Authors: A. Attiaoui, É. Bouthillier, G. Daligou, A. Kumar, S. Assali, O. Moutanabbir

Abstract: Engineering light absorption in the extended short-wave infrared (e-SWIR) range using scalable materials is a long-sought-after capability that is crucial to implement cost-effective and high-performance sensing and imaging technologies. Herein, we demonstrate enhanced, tunable e-SWIR absorption using silicon-integrated platforms consisting of ordered arrays of metastable GeSn nanowires with Sn co… ▽ More Engineering light absorption in the extended short-wave infrared (e-SWIR) range using scalable materials is a long-sought-after capability that is crucial to implement cost-effective and high-performance sensing and imaging technologies. Herein, we demonstrate enhanced, tunable e-SWIR absorption using silicon-integrated platforms consisting of ordered arrays of metastable GeSn nanowires with Sn content reaching 9 at.% and variable diameters. Detailed simulations were combined with experimental analyses to systematically investigate light-GeSn nanowire interactions to tailor and optimize the nanowire array geometrical parameters and the corresponding optical response. The diameter-dependent leaky mode resonance peaks are theoretically predicted and experimentally confirmed with a tunable wavelength from 1.5 to 2.2 μm. A three-fold enhancement in the absorption with respect to GeSn layers at 2.1 μm was achieved using nanowires with a diameter of 325 nm. Finite difference time domain simulations unraveled the underlying mechanisms of the e-SWIR enhanced absorption. Coupling of the HE11 and HE12 resonant modes to nanowires is observed at diameters above 325 nm, while at smaller diameters and longer wavelengths the HE11 mode is guided into the underlying Ge layer. The presence of tapering in NWs further extends the absorption range while minimizing reflection. This ability to engineer and enhance e-SWIR absorption lays the groundwork to implement novel photonic devices exploiting all-group IV platforms. △ Less

Submitted 7 July, 2020; originally announced July 2020.

Comments: 15 pages, 5 figures, 2 Tables, 8 Supplementary information Figures

Journal ref: Phys. Rev. Applied 15, 014034 (2021)

Vanishing Zeeman energy in a two-dimensional hole gas

Authors: Patrick Del Vecchio, Mario Lodari, Amir Sammak, Giordano Scappucci, Oussama Moutanabbir

Abstract: A clear signature of Zeeman split states crossing is observed in Landau fan diagram of strained germanium two-dimensional hole gas. The underlying mechanisms are discussed based on a perturbative model yielding a closed formula for the critical magnetic fields. These fields depend strongly on the energy difference between the top-most and the neighboring valence bands and are sensitive to the quan… ▽ More A clear signature of Zeeman split states crossing is observed in Landau fan diagram of strained germanium two-dimensional hole gas. The underlying mechanisms are discussed based on a perturbative model yielding a closed formula for the critical magnetic fields. These fields depend strongly on the energy difference between the top-most and the neighboring valence bands and are sensitive to the quantum well thickness, strain, and spin-orbit-interaction. The latter is a necessary feature for the crossing to occur. This framework enables a straightforward quantification of the hole-state parameters from simple measurements, thus paving the way for its use in design and modelling of hole-based quantum devices. △ Less

Submitted 19 October, 2020; v1 submitted 29 May, 2020; originally announced June 2020.

Comments: Corrected typos in expressions for F_l. Minor changes to sections layout

Journal ref: Phys. Rev. B 102, 115304 (2020)

Pnictogens Allotropy and Phase Transformation during van der Waals Growth

Authors: Matthieu Fortin-Deschênes, Hannes Zschiesche, Tevfik O. Menteş, Andrea Locatelli, Robert M. Jacobberger, Francesca Genuzio, Maureen J. Lagos, Deepnarayan Biswas, Chris Jozwiak, Jill A. Miwa, Søren Ulstrup, Aaron Bostwick, Eli Rotenberg, Michael S. Arnold, Gianluigi A. Botton, Oussama Moutanabbir

Abstract: Pnictogens have multiple allotropic forms resulting from their ns2 np3 valence electronic configuration, making them the only elemental materials to crystallize in layered van der Waals (vdW) and quasi-vdW structures throughout the group. Light group VA elements are found in the layered orthorhombic A17 phase such as black phosphorus, and can transition to the layered rhombohedral A7 phase at high… ▽ More Pnictogens have multiple allotropic forms resulting from their ns2 np3 valence electronic configuration, making them the only elemental materials to crystallize in layered van der Waals (vdW) and quasi-vdW structures throughout the group. Light group VA elements are found in the layered orthorhombic A17 phase such as black phosphorus, and can transition to the layered rhombohedral A7 phase at high pressure. On the other hand, bulk heavier elements are only stable in the A7 phase. Herein, we demonstrate that these two phases not only co-exist during the vdW growth of antimony on weakly interacting surfaces, but also undertake a spontaneous transformation from the A17 phase to the thermodynamically stable A7 phase. This metastability of the A17 phase is revealed by real-time studies unraveling its thickness-driven transition to the A7 phase and the concomitant evolution of its electronic properties. At a critical thickness of ~4 nm, A17 antimony undergoes a diffusionless shuffle transition from AB to AA stacked alpha-antimonene followed by a gradual relaxation to the A7 bulk-like phase. Furthermore, the electronic structure of this intermediate phase is found to be determined by surface self-passivation and the associated competition between A7- and A17-like bonding in the bulk. These results highlight the critical role of the atomic structure and interfacial interactions in shaping the stability and electronic characteristics of vdW layered materials, thus enabling a new degree of freedom to engineer their properties using scalable processes. △ Less

Submitted 28 May, 2020; originally announced May 2020.

Mid-infrared emission and absorption in strained and relaxed direct bandgap GeSn semiconductors

Authors: Simone Assali, Alain Dijkstra, Anis Attiaoui, Étienne Bouthillier, Jos E. M. Haverkort, Oussama Moutanabbir

Abstract: By independently engineering strain and composition, this work demonstrates and investigates direct band gap emission in the mid-infrared range from GeSn layers grown on silicon. We extend the room-temperature emission wavelength above ~4.0 μm upon post-growth strain relaxation in layers with uniform Sn content of 17 at.%. The fundamental mechanisms governing the optical emission are discussed bas… ▽ More By independently engineering strain and composition, this work demonstrates and investigates direct band gap emission in the mid-infrared range from GeSn layers grown on silicon. We extend the room-temperature emission wavelength above ~4.0 μm upon post-growth strain relaxation in layers with uniform Sn content of 17 at.%. The fundamental mechanisms governing the optical emission are discussed based on temperature-dependent photoluminescence, absorption measurements, and theoretical simulations. Regardless of strain and composition, these analyses confirm that single-peak emission is always observed in the probed temperature range of 4-300 K, ruling out defect- and impurity-related emission. Moreover, carrier losses into thermally-activated non-radiative recombination channels are found to be greatly minimized as a result of strain relaxation. Absorption measurements validate the direct band gap absorption in strained and relaxed samples at energies closely matching photoluminescence data. These results highlight the strong potential of GeSn semiconductors as versatile building blocks for scalable, compact, and silicon-compatible mid-infrared photonics and quantum opto-electronics. △ Less

Submitted 22 December, 2020; v1 submitted 28 April, 2020; originally announced April 2020.

Journal ref: Phys. Rev. Applied 15, 024031 (2021)

Dislocation pipe diffusion and solute segregation during the growth of metastable GeSn

Authors: Jérôme Nicolas, Simone Assali, Samik Mukherjee, Andriy Lotnyk, Oussama Moutanabbir

Abstract: Controlling the growth kinetics from the vapor phase has been a powerful paradigm enabling a variety of metastable epitaxial semiconductors such as Sn-containing group IV semiconductors (Si)GeSn. In addition to its importance for emerging photonic and optoelectronic applications, this class of materials is also a rich platform to highlight the interplay between kinetics and thermodynamic driving f… ▽ More Controlling the growth kinetics from the vapor phase has been a powerful paradigm enabling a variety of metastable epitaxial semiconductors such as Sn-containing group IV semiconductors (Si)GeSn. In addition to its importance for emerging photonic and optoelectronic applications, this class of materials is also a rich platform to highlight the interplay between kinetics and thermodynamic driving forces during growth of strained, nonequilibrium alloys. Indeed, these alloys are inherently strained and supersaturated in Sn and thus can suffer instabilities that are still to be fully elucidated. In this vein, in this work the atomic-scale microstructure of Ge0.82Sn0.18 is investigated at the onset of phase separation as the epitaxial growth aborts. In addition to the expected accumulation of Sn on the surface leading to Sn-rich droplets and sub-surface regions with the anticipated equilibrium Sn composition of 1.0at.%, the diffusion of Sn atoms also yields conspicuous Sn-decorated filaments with nonuniform Sn content in the range of ~1 to 11at.% . The latter are attributed to the formation and propagation of dislocations, facilitating the Sn transport toward the surface through pipe diffusion. Furthermore, the interface between the Sn droplet and GeSn shows a distinct, defective layer with Sn content of ~22at.%. This layer is likely formed by the expelled excess equilibrium Ge as the Sn solidifies, and its content seems to be a consequence of strain minimization between tetragonal Sn-rich and cubic Ge-rich equilibrium phases. The elucidation of these phenomena is crucial to understand the stability of GeSn semiconductors and control their epitaxial growth at a uniform composition. △ Less

Submitted 2 March, 2020; originally announced March 2020.

Comments: Submitted to Crystal Growth & Design. 20 pages. 5 figures

Journal ref: Crystal Growth & Design 2020

Intersubband transition engineering in the conduction band of asymmetric coupled Ge/SiGe quantum wells

Authors: Luca Persichetti, Michele Montanari, Chiara Ciano, Luciana Di Gaspare, Michele Ortolani, Leonetta Baldassarre, Marvin H. Zoellner, Samik Mukherjee, Oussama Moutanabbir, Giovanni Capellini, Michele Virgilio, Monica De Seta

Abstract: : n-type Ge/SiGe asymmetric-coupled quantum wells represent the building block of a variety of nanoscale quantum devices, including recently proposed designs for a silicon-based THz quantum cascade laser. In this paper, we combine structural and spectroscopic experiments on 20-module superstructures, each featuring two Ge wells coupled through a Ge-rich tunnel barrier, as a function of the geometr… ▽ More : n-type Ge/SiGe asymmetric-coupled quantum wells represent the building block of a variety of nanoscale quantum devices, including recently proposed designs for a silicon-based THz quantum cascade laser. In this paper, we combine structural and spectroscopic experiments on 20-module superstructures, each featuring two Ge wells coupled through a Ge-rich tunnel barrier, as a function of the geometry parameters of the design and the P dopant concentration. Through the comparison of THz spectroscopic data with numerical calculations of intersubband optical absorption resonances, we demonstrated that it is possible to tune by design the energy and the spatial overlap of quantum confined subbands in the conduction band of the heterostructures. The high structural/interface quality of the samples and the control achieved on subband hybridization are the promising starting point towards a working electrically pumped light-emitting device. △ Less

Submitted 12 February, 2020; originally announced February 2020.

Journal ref: Crystals 2020, 10(3), 179

Atomic-scale insights into semiconductor heterostructures: from experimental three-dimensional analysis of the interface to a generalized theory of interface roughness scattering

Authors: T. Grange, S. Mukherjee, G. Capellini, M. Montanari, L. Persichetti, L. Di Gaspare, S. Birner, A. Attiaoui, O. Moutanabbir, M. Virgilio, M. De Seta

Abstract: We develop a generalized theory for the scattering process produced by interface roughness on charge carriers and which is suitable for any semiconductor heterostructure. By exploiting our experimental insights into the three-dimensional atomic landscape obtained on Ge/GeSi heterointerfaces obtained by atom probe tomography, we have been able to define the full set of interface parameters relevant… ▽ More We develop a generalized theory for the scattering process produced by interface roughness on charge carriers and which is suitable for any semiconductor heterostructure. By exploiting our experimental insights into the three-dimensional atomic landscape obtained on Ge/GeSi heterointerfaces obtained by atom probe tomography, we have been able to define the full set of interface parameters relevant to the scattering potential, including both the in-plane and axial correlation inside real diffuse interfaces. Our experimental findings indicate a partial coherence of the interface roughness along the growth direction within the interfaces. We show that it is necessary to include this feature, previously neglected by theoretical models, when heterointerfaces characterized by finite interface widths are taken into consideration. △ Less

Submitted 24 April, 2020; v1 submitted 3 February, 2020; originally announced February 2020.

Journal ref: Phys. Rev. Applied 13, 044062 (2020)

Thermally activated diffusion and lattice relaxation in (Si)GeSn materials

Authors: Nils von den Driesch, Stephan Wirths, Rene Troitsch, Gregor Mussler, Uwe Breuer, Oussama Moutanabbir, Detlev Grützmacher, Dan Buca

Abstract: Germanium-Tin (GeSn) alloys have emerged as a promising material for future optoelectronics, energy harvesting and nanoelectronics owing to their direct bandgap and compatibility with existing Si-based electronics. Yet, their metastability poses significant challenges calling for in-depth investigations of their thermal behavior. With this perspective, this work addresses the interdiffusion proces… ▽ More Germanium-Tin (GeSn) alloys have emerged as a promising material for future optoelectronics, energy harvesting and nanoelectronics owing to their direct bandgap and compatibility with existing Si-based electronics. Yet, their metastability poses significant challenges calling for in-depth investigations of their thermal behavior. With this perspective, this work addresses the interdiffusion processes throughout thermal annealing of pseudomorphic GeSn binary and SiGeSn ternary alloys. In both systems, the initially pseudomorphic layers are relaxed upon annealing exclusively via thermally induced diffusional mass transfer of Sn. Systematic post-growth annealing experiments reveal enhanced Sn and Si diffusion regimes that manifest at temperatures below 600°C. The amplified low-temperature diffusion and the observation of only subtle differences between binary and ternary hint at the unique metastability of the Si-Ge-Sn material system as the most important driving force for phase separation. △ Less

Submitted 6 November, 2019; originally announced November 2019.

Comments: 15 pages, 3 figures

Journal ref: Phys. Rev. Materials 4, 033604 (2020)

3-D Atomic Mapping of Interfacial Roughness and its Spatial Correlation Length in sub-10 nm Superlattices

Authors: Samik Mukherjee, Anis Attiaoui, Matthias Bauer, Oussama Moutanabbir

Abstract: The interfacial abruptness and uniformity in heterostructures are critical to control their electronic and optical properties. With this perspective, this work demonstrates the 3-D atomistic-level mapping of the roughness and uniformity of buried epitaxial interfaces in Si/SiGe superlattices with a layer thickness in the 1.5-7.5 nm range. Herein, 3-D atom-by-atom maps were acquired and processed t… ▽ More The interfacial abruptness and uniformity in heterostructures are critical to control their electronic and optical properties. With this perspective, this work demonstrates the 3-D atomistic-level mapping of the roughness and uniformity of buried epitaxial interfaces in Si/SiGe superlattices with a layer thickness in the 1.5-7.5 nm range. Herein, 3-D atom-by-atom maps were acquired and processed to generate iso-concentration surfaces highlighting local fluctuations in content at each interface. These generated surfaces were subsequently utilized to map the interfacial roughness and its spatial correlation length. The analysis revealed that the root mean squared roughness of the buried interfaces in the investigated superlattices is sensitive to the growth temperature with a value varying from about 0.2 nm (+/- 13%) to about 0.3 nm (+/- 11.5%) in the temperature range of 500-650 Celsius. The estimated horizontal correlation lengths were found to be 8.1 nm (+/- 5.8%) at 650 Celsius and 10.1 nm (+/- 6.2%) at 500 Celsius. Additionally, reducing the growth temperature was found to improve the interfacial abruptness, with 30 % smaller interfacial width is obtained at 500 Celsius. This behavior is attributed to the thermally activated atomic exchange at the surface during the heteroepitaxy. Finally, by testing different optical models with increasing levels of interfacial complexity, it is demonstrated that the observed atomic-level roughening at the interface must be accounted for to accurately describe the optical response of Si/SiGe heterostructures. △ Less

Submitted 2 August, 2019; originally announced August 2019.

Comments: 17 A4 pages of main manuscript, 2 table, 5 figures, 20 A4 pages of supplementary information

Vacancy complexes in nonequilibrium germanium-tin semiconductors

Authors: Simone Assali, Mohamed Elsayed, Jérôme Nicolas, Maciej Oskar Liedke, Andreas Wagner, Maik Butterling, Reinhard Krause-Rehberg, Oussama Moutanabbir

Abstract: Understanding the nature and behavior of vacancy-like defects in epitaxial GeSn metastable alloys is crucial to elucidate the structural and optoelectronic properties of these emerging semiconductors. The formation of vacancies and their complexes is expected to be promoted by the relatively low substrate temperature required for the epitaxial growth of GeSn layers with Sn contents significantly a… ▽ More Understanding the nature and behavior of vacancy-like defects in epitaxial GeSn metastable alloys is crucial to elucidate the structural and optoelectronic properties of these emerging semiconductors. The formation of vacancies and their complexes is expected to be promoted by the relatively low substrate temperature required for the epitaxial growth of GeSn layers with Sn contents significantly above the equilibrium solubility of 1 at.%. These defects can impact both the microstructure and charge carrier lifetime. Herein, to identify the vacancy-related complexes and probe their evolution as a function of Sn content, depth-profiled pulsed low-energy positron annihilation lifetime spectroscopy and Doppler broadening spectroscopy were combined to investigate GeSn epitaxial layers with Sn content in the 6.5-13.0 at.% range. The samples were grown by chemical vapor deposition method at temperatures between 300 and 330 °C. Regardless of the Sn content, all GeSn samples showed the same depth-dependent increase in the positron annihilation line broadening parameters, which confirmed the presence of open volume defects. The measured average positron lifetimes were the highest (380-395 ps) in the region near the surface and monotonically decrease across the analyzed thickness, but remain above 350 ps. All GeSn layers exhibit lifetimes that are 85 to 110 ps higher than the Ge reference layers. Surprisingly, these lifetimes were found to decrease as Sn content increases in GeSn layers. These measurements indicate that divacancies are the dominant defect in the as-grown GeSn layers. However, their corresponding lifetime was found to be shorter than in epitaxial Ge thus suggesting that the presence of Sn may alter the structure of divacancies. Additionally, GeSn layers were found to also contain a small fraction of vacancy clusters, which become less important as Sn content increases. △ Less

Submitted 22 April, 2019; originally announced April 2019.

Decoupling the effects of composition and strain on the vibrational modes of GeSn

Authors: Étienne Bouthillier, Simone Assali, Jérôme Nicolas, Oussama Moutanabbir

Abstract: We report on the behavior of Ge-Ge, Ge-Sn, Sn-Sn like and disorder-activated vibrational modes in GeSn semiconductors investigated using Raman scattering spectroscopy. By using an excitation wavelength close to E1 gap, all modes are clearly resolved and their evolution as a function of strain and Sn content is established. In order to decouple the individual contribution of content and strain, the… ▽ More We report on the behavior of Ge-Ge, Ge-Sn, Sn-Sn like and disorder-activated vibrational modes in GeSn semiconductors investigated using Raman scattering spectroscopy. By using an excitation wavelength close to E1 gap, all modes are clearly resolved and their evolution as a function of strain and Sn content is established. In order to decouple the individual contribution of content and strain, the analysis was conducted on series of pseudomorphic and relaxed epitaxial layers with a Sn content in the 5-17at.% range. All vibrational modes were found to display the same qualitative behavior as a function of content and strain, viz. a linear downshift as the Sn content increases or the compressive strain relaxes. Simultaneously, Ge-Sn and Ge-Ge peaks broaden, and the latter becomes increasingly asymmetric. This asymmetry, coupled with the peak position, is exploited in an empirical method to accurately quantify the Sn composition and lattice strain from Raman spectra. △ Less

Submitted 2 January, 2019; originally announced January 2019.

Atomic Order in Non-Equilibrium Silicon-Germanium-Tin Semiconductors

Authors: S. Mukherjee, N. Kodali, D. Isheim, S. Wirths, J. M. Hartmann, D. Buca, D. N. Seidman, O. Moutanabbir

Abstract: The precise knowledge of the atomic order in monocrystalline alloys is fundamental to understand and predict their physical properties. With this perspective, we utilized laser-assisted atom probe tomography to investigate the three-dimensional distribution of atoms in non-equilibrium epitaxial Sn-rich group IV SiGeSn ternary semiconductors. Different atom probe statistical analysis tools includin… ▽ More The precise knowledge of the atomic order in monocrystalline alloys is fundamental to understand and predict their physical properties. With this perspective, we utilized laser-assisted atom probe tomography to investigate the three-dimensional distribution of atoms in non-equilibrium epitaxial Sn-rich group IV SiGeSn ternary semiconductors. Different atom probe statistical analysis tools including frequency distribution analysis, partial radial distribution functions, and nearest neighbor analysis were employed in order to evaluate and compare the behavior of the three elements to their spatial distributions in an ideal solid solution. This atomistic-level analysis provided clear evidence of an unexpected repulsive interaction between Sn and Si leading to the deviation of Si atoms from the theoretical random distribution. This departure from an ideal solid solution is supported by first principal calculations and attributed to the tendency of the system to reduce its mixing enthalpy throughout the layer-by-layer growth process. △ Less

Submitted 4 February, 2017; originally announced February 2017.

Comments: 15 pages, 4 figures

Journal ref: Phys. Rev. B 95, 161402 (2017)

Enhanced IR Light Absorption in Group IV-SiGeSn Core-Shell Nanowires

Authors: Anis Attiaoui, Stephan Wirth, André-Pierre Blanchard-Dionne, Michel Meunier, J. M. Hartmann, Dan Buca, Oussama Moutanabbir

Abstract: Sn-containing Si and Ge alloys belong to an emerging family of semiconductors with the potential to impact group IV semiconductor devices. Indeed, the ability to independently engineer both lattice parameter and band gap holds the premise to develop enhanced or novel photonic, optoelectronic, and electronic devices. With this perspective, we present detailed investigations of the influence of Ge1-… ▽ More Sn-containing Si and Ge alloys belong to an emerging family of semiconductors with the potential to impact group IV semiconductor devices. Indeed, the ability to independently engineer both lattice parameter and band gap holds the premise to develop enhanced or novel photonic, optoelectronic, and electronic devices. With this perspective, we present detailed investigations of the influence of Ge1-y-xSixSny layers on the optical properties of Si- and Ge-based heterostructures and nanowires. We found that adding a thin Ge1-x-ySixSny capping layer on Si or Ge greatly enhances light absorption especially in the near IR range leading to an increase in short-circuit current density. For the Ge1-y-xSixSny structure at thicknesses below 30 nm, a 14-fold increase in the short-circuit current is predicted with respect to bare Si. This enhancement decreases by reducing the capping layer thickness. Conversely, decreasing the shell thickness was found to improve the short-circuit current in Si/Ge1-y-xSixSny and Ge/Ge1-y-xSixSny core/shell nanowires. The optical absorption becomes very important when increasing the Sn content. Moreover, by exploiting optical antenna effect, these nanowires show an extreme light absorption reaching an enhancement factor, with respect to Si or Ge nanowires, on the order of ~104 in Si/Ge0.84Si0.04Sn0.12 and ~12 in Ge/Ge0.84Si0.04Sn0.12 core/shell nanowires. Furthermore, we analyzed the optical response of the addition of a dielectric capping layer consisting of Si3N4 to the Si/Ge1-y-xSixSny core-shell nanowire and found about 50% increase in short-circuit current density for a dielectric layer thickness of 45 nm and a core radius and shell thickness superior to 40 nm. The core/shell optical antenna benefits from a multiplication of enhancements contributed by leaky mode resonances in the semiconductor part and antireflection effects in the dielectric part. △ Less

Submitted 2 February, 2017; originally announced February 2017.

Comments: 47 pages, 11 figures

Excitonic Aharonov-Bohm Effect in Isotopically Pure 70Ge/Si Type-II Quantum Dots

Authors: Satoru Miyamoto, Oussama Moutanabbir, Toyofumi Ishikawa, Mikio Eto, Eugene E. Haller, Kentarou Sawano, Yasuhiro Shiraki, Kohei M. Itoh

Abstract: We report on a magneto-photoluminescence study of isotopically pure 70Ge/Si self-assembled type-II quantum dots. Oscillatory behaviors attributed to the Aharonov-Bohm effect are simultaneously observed for the emission energy and intensity of excitons subject to an increasing magnetic field. When the magnetic flux penetrates through the ring-like trajectory of an electron moving around each quan… ▽ More We report on a magneto-photoluminescence study of isotopically pure 70Ge/Si self-assembled type-II quantum dots. Oscillatory behaviors attributed to the Aharonov-Bohm effect are simultaneously observed for the emission energy and intensity of excitons subject to an increasing magnetic field. When the magnetic flux penetrates through the ring-like trajectory of an electron moving around each quantum dot, the ground state of an exciton experiences a change in its angular momentum. Our results provide the experimental evidence for the phase coherence of a localized electron wave function in group-IV Ge/Si self-assembled quantum structures. △ Less

Submitted 11 February, 2010; originally announced February 2010.

Comments: 4 pages, 4 figures