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Formation of ultrashallow junctions less than 10nm with the combination of low energy B ion implantation and laser annealing / Yamada, Ryuta ; Seto, Singo ; Sato, Sosi ; Tanaka, Yuki ; Matumoto, Satoru ; Suzuki, Toshiharu ; Fuse, Gensyu ; Kudo, Tosio ; Sakuragi, Susumu
2006 - Published in : AIP Conf. Proc.: 866 (2006) , pp. 17-20 External link: Published version from AIP
In : 16th International Conference on Ion Implantation Technology, Marseilles, France, 11 - 16 Jun 2006, pp.17-20

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