Página principal > Impact of Fluorine co-implant on Boron Diffusion during Non-melt Laser Annealing |
Article | |
Title | Impact of Fluorine co-implant on Boron Diffusion during Non-melt Laser Annealing |
Author(s) | Noda, T ; Felch, S ; Parihar, V ; Vrancken, C ; Janssens, T ; Bender, H ; VanDaele, B ; Vandervorst, W |
Publication | 2006 |
In: | AIP Conf. Proc. 866 (2006) pp.21-24 |
In: | 16th International Conference on Ion Implantation Technology, Marseilles, France, 11 - 16 Jun 2006, pp.21-24 |